WebJan 7, 2024 · CF 4 + e → CF 3 + F + e F原子はSi基板まで拡散し、表面で以下のような反応を起こしてSiをエッチングします（ 図1 ）。 Si（固体） + 4F → SiF 4 （気体） … WebHitachi Global
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Web抄録. Dry etching for Ge waveguide has been researched by using inductively coupled plasma technique with CHFj gas. It realizes a high selectivity of 5:1 against regular photoresist mask. Moreover, anisotropic etching without under-cut has been successfully realized with an etched siclewall angle of 85 degree with an etching rate of 190 nm/min. WebDepartment of Chemistry, UBC Faculty of Science. Vancouver Campus. 2036 Main Mall. Vancouver, BC Canada V6T 1Z1. Tel: 604.822.3266. Fax: 604.822.2847 login to intuit account in quickbooks
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WebInfobox references. Trifluoromethane or fluoroform is the chemical compound with the formula CHF 3. It is one of the "haloforms", a class of compounds with the formula CHX 3 (X = halogen) with C 3v symmetry. Fluoroform is used in diverse applications in organic synthesis. It is not an ozone depleter but is a greenhouse gas. Web(57)【要約】 【課題】 GaAs層とAlGaAs層との選択比が大 きく、pHの経時変化が少なく、安定に量産することが でき、密集した微細パターンをエッチングする場合にお いても十分にエッチングすることができる半導体のエッ チング液、調製方法及びエッチング方法を提供すること を目的とする。 Web212 Sung Ku Kwon et al. ETRI Journal, Volume 24, Number 3, June 2002 predictions and actual measurements. As an alternative, some studies have adopted adaptive learning techniques which use neural networks combined with statistical experimental designs inerrancy infallibility